Photoresist compositions
US6037107A · kind A · utility
16Cited by
4References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 28, 1997 |
| Grant date | Mar 14, 2000 |
| Priority date | — |
| Expiry date | Aug 28, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides photoresist compositions comprising a resin binder having acid labile blocking groups requiring an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base additive. It has been found that linewidth variation is substantially reduced when using the halogenated sulfonic acid generator in a process involving a high temperature post exposure bake.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.