Nanoporous silica via combined stream deposition
US6037275A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1998 |
| Grant date | Mar 14, 2000 |
| Priority date | — |
| Expiry date | Aug 27, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02282
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process for forming a nanoporous dielectric coating on a substrate. The process includes either (i) combining a stream of an alkoxysilane composition with a stream of a base containing catalyst composition to form a combined composition stream; immediately depositing the combined composition stream onto a surface of a substrate and exposing the combined composition to water (in either order or simultaneously); and curing the combined composition; or (ii) combining a stream of an alkoxysilane composition with a stream of water to form a combined composition stream; immediately depositing the combined composition stream onto a surface of a substrate; and curing the combined composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.