Short wavelength pulsed laser scanner
US6037967A · kind A · utility
34Cited by
23References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 18, 1996 |
| Grant date | Mar 14, 2000 |
| Priority date | — |
| Expiry date | Dec 18, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0275
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A laser pattern generator for semiconductor mask making or direct writing of features on a semiconductor wafer uses a pulsed laser source to achieve high power and short wavelength (e.g. 263 nm or less) radiation, for writing very small-sized features. The laser pulse frequency is either synchronous or asynchronous to the writing grid of the features being written, in various embodiments.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.