Focused particle beam systems and methods using a tilt column
US6039000A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 11, 1998 |
| Grant date | Mar 21, 2000 |
| Priority date | — |
| Expiry date | Feb 11, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31745
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Particle beam systems and methods for interacting with a workpiece according to this invention include a work stage assembly and a first particle beam source. The work stage assembly is adapted a) for supporting a workpiece, b) for translating along a first axis, c) for translating along a second axis perpendicular to the first axis, and d) for rotating about a third axis perpendicular to both the first axis and the second axis. The work stage assembly has a work stage axis substantially parallel to the third axis. The first particle beam source for interacting with the workpiece is supported by the work stage assembly. The first particle beam source has a first particle beam axis. In one embodiment, the first particle beam source is oriented so that the first particle beam axis forms an angle with the third axis. In another embodiment, the first particle beam source is tiltable from a first position, with the first particle beam axis substantially parallel to the third axis, to a second position, with the first particle beam axis forming an angle with the third axis. Thus, the particle beam system can etch and image a vertical cross-section of the workpiece without offsetting the …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.