Copolymers and photoresist compositions comprising copolymer resin binder component
US6042997A · kind A · utility
48Cited by
12References
20Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 23, 1998 |
| Grant date | Mar 28, 2000 |
| Priority date | — |
| Expiry date | Jan 23, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.