Fractionated novolak resin and photoresist composition therefrom
US6045966A · kind A · utility
3Cited by
2References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 15, 1997 |
| Grant date | Apr 4, 2000 |
| Priority date | — |
| Expiry date | Dec 15, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G8/08
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such a novolak resin fraction. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.