Photoresist compositions and methods and articles of manufacture comprising same
US6048672A · kind A · utility
33Cited by
5References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 20, 1998 |
| Grant date | Apr 11, 2000 |
| Priority date | — |
| Expiry date | Feb 20, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention includes use of a positive chemically amplified photoresist composition that produces a strong photogenerated acid. The resist is coated onto a metal substrate that has been subjected to a stringent bake step, e.g. heating of the substrate at about at least 140.degree. C. for more than 60 seconds. The combined use of strong photogenerated acid and stringent pre-coating substrate bake provides highly resolved resist relief images, including on metal substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.