Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom
US6051678A · kind A · utility
19Cited by
4References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 13, 1997 |
| Grant date | Apr 18, 2000 |
| Priority date | — |
| Expiry date | Mar 13, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Copolymers containing N-vinyllactam derivatives protected at 3-position are provided and represented by the following formula. The copolymers are used as a photoresist material suitable for deep uv process so that high sensitivity and resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in PED stability can be accomplished by use of the photoresist. ##STR1##
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.