Patent · US Expired

Manufacture method for micromechanical devices

US6053617A · kind A · utility

25Cited by
8References
4Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 23, 1994
Grant dateApr 25, 2000
Priority date
Expiry dateSep 23, 2014

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B26/0841
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A process for manufacturing micromechanical devices. The process includes the step of covering the activation circuitry (201) and those parts of the device that come in contact with moving parts with a pad film (202). The pad film prevents frictional wear and sticking of the moving parts, and can prevent electrical shorts between different parts of the activation circuitry. Additionally, the pad film can prevent particulates from interfering with the operation of the device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.