Toshiyuki Kaeriyama
22Patents
10h-index
30Co-inventors
75Inventor score
Filing activity: Dec 13, 1988 → Oct 22, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5646768A | Support posts for micro-mechanical devices | Emerging Cross-Sectional Technologies | 323 | Expired |
| US6099132A | Manufacture method for micromechanical devices | Physics | 222 | Expired |
| US5485304A | Support posts for micro-mechanical devices | Emerging Cross-Sectional Technologies | 133 | Expired |
| US5497262A | Support posts for micro-mechanical devices | Emerging Cross-Sectional Technologies | 99 | Expired |
| US5872046A | Method of cleaning wafer after partial saw | Electricity | 58 | Expired |
| US5804479A | Method for forming semiconductor integrated circuit device having a capacitor | Electricity | 46 | Expired |
| US4855798A | Semiconductor and process of fabrication thereof | Emerging Cross-Sectional Technologies | 42 | Expired |
| US6150214A | Titanium nitride metal interconnection system and method of forming the same | Electricity | 28 | Expired |
| US6053617A | Manufacture method for micromechanical devices | Physics | 25 | Expired |
| US6618186B2 | Micro-electromechanical system | Physics | 19 | Expired |
| US6528835B1 | Titanium nitride metal interconnection system and method of forming the same | Electricity | 10 | Expired |
| US6060352A | Method of manufacturing semiconductor device with increased focus margin | Electricity | 9 | Expired |
| US5933726A | Method of forming a semiconductor device have a screen stacked cell capacitor | Electricity | 7 | Expired |
| US5933724A | Method of manufacturing a semiconductor integrated circuit device using a photomask in which transmitted light beam intensities are controlled | Electricity | 7 | Expired |
| US5937290A | Method of manufacturing semiconductor integrated circuit devices using phase shifting mask | Emerging Cross-Sectional Technologies | 5 | Expired |
| US6753219B2 | Method of manufacturing semiconductor integrated circuit devices having a memory device with a reduced bit line stray capacity and such semiconductor integrated circuit devices | Electricity | 4 | Expired |
| US7692841B2 | System and method for regulating micromirror position | Physics | 4 | Active |
| US6987601B2 | Damped control of a micromechanical device | Physics | 4 | Expired |
| US5804034A | Method for manufacturing semiconductor device | Electricity | 3 | Expired |
| US6077735A | Method of manufacturing semiconductor device | Electricity | 2 | Expired |
| US8610997B2 | Micro-electromechanical device | Physics | 1 | Active |
| US6969649B2 | Method of manufacturing semiconductor integrated circuit devices having a memory device with a reduced bit line stray capacity and such semiconductor integrated circuit devices | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.