Electron beam profile measurement method and system
US6058221A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 16, 1998 |
| Grant date | May 2, 2000 |
| Priority date | — |
| Expiry date | Jan 16, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/42
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In a method of measuring electron beam profile in an electronic display device, a matrix of video dots is displayed on a display screen of the electronic display device, each of the video dots being comprised of a group of phosphor dots illuminated by an electron beam. An image of a plurality of groups of illuminated phosphor dots forming the video dots within a field of view is then taken. The average horizontal and vertical distances of the video dots within the filed of view is determined and the groups of illuminated phosphor dots forming the video dots in the field of view that are captured in the image are superimposed based on the average horizontal and vertical distances of the video dots generally to average and fill in discontinuities between phosphor dots in the groups and thereby generate an overlay image of the electron beam. Cross-sections of the overlay image can be approximated and at least one intensity profile of the electron beam calculated. Overlay images of each color electron beam can also be captured simultaneously and a convergence error calculated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.