Wafer cleaning system
US6059888A · kind A · utility
21Cited by
7References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 13, 1998 |
| Grant date | May 9, 2000 |
| Priority date | — |
| Expiry date | Nov 13, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B1/34
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A wafer scrubbing system includes a upper and lower elongated scrubbers extending generally parallel with one another, the scrubbers being driven in rotation about their own axes. The wafer is disposed between the scrubbers so that the top and bottom surfaces of the wafer engage the scrubbers. The scrubbers are arranged to provide different frictional forces with the wafer at opposite ends of the scrubbers, and thereby provide a torque on the wafer about a central axis transverse to the top and bottom surfaces of the wafer and transverse to the scrubber axes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.