Trap for capturing waste by-product generated by a chemical vapor deposition system
US6063197A · kind A · utility
7Cited by
6References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 1997 |
| Grant date | May 16, 2000 |
| Priority date | — |
| Expiry date | Sep 29, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D8/00
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A chemical vapor deposition system including a chemical vapor deposition chamber, an inlet line for directing reactant gases into the deposition chamber, and outlet line for discharging waste by-product from the deposition chamber, and a detachable trap position along the outlet line for trapping at least a portion of the waste by-product. The trap can include an array of baffles for increasing the surface area within the trap and disrupting flow within the trap. The trap can also include cooling structure for cooling at least a portion of the trap to enhance waste by-product deposition within the trap.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.