Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture

US6063545A · kind A · utility

Assignee

• Clariant Corporation · DE

Inventors

• Horst Roeschert · Ober-Hilbersheim, DE
• Juergen Fuchs · Flörsheim, DE
• Walter Spiess · Dieburg, DE
• Charlotte Eckes · Mainz, DE
• Georg Pawlowski · Saitama, JP
• Ralph R. Dammel · Flemington, US

Key dates

• Filing date: Apr 20, 1992
• Grant date: May 16, 2000
• Expiry date: Apr 20, 2012

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/122
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

A negative-working radiation-sensitive mixture containing PA0 a) a compound which generates a strong acid under the action of actinic radiation, PA0 b) a compound having at least two groups crosslinkable by means of acid and PA0 c) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions, wherein the compound (a) comprises a di-, tri- or tetra-hydroxybenzene which may be further substituted, or a polymer containing a di-, tri-, or tetra- hydroxy phenyl radical, is esterified with respectively 2, 3 or 4 sulfonic acids of the formula R--SO.sub.3 H, and is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation-sensitive recording material produced with this mixture is suitable for the production of photoresists, electronic components, printing plates or for chemical milling.