Patent · US Expired

Oxide etch and method of etching

US6063712A · kind A · utility

235Cited by
5References
40Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 25, 1997
Grant dateMay 16, 2000
Priority date—
Expiry dateNov 25, 2017

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/31111
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An oxide etchant and method of etching are provided. The etchant includes at least one fluorine-containing compound and at least one auxiliary component selected from the group of a boron-containing compound and a phosphorus-containing compound.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.