Volatile magnesium alkylaluminum alkoxide and deposition of magnesium aluminate film using same
US6063951A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 1998 |
| Grant date | May 16, 2000 |
| Priority date | — |
| Expiry date | Aug 11, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07F5/06
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Novel magnesium dialkylaluminum alkoxide derivative represented by Mg[(.mu.--OR').sub.2 AlR.sub.2 ].sub.2 wherein R and R' are each a C.sub.1-5 alkyl group and R is not the same as R', preferably magnesium dimethylaluminum isopropoxide, is easily prepared by reacting a trialkylaluminum with an alcohol or an aluminum trialkoxide to obtain a dialkylaluminum alkoxide; reacting the dialkylaluminium alkoxide with an alkali metal alkoxide to obtain an alkali metal dialkylaluminum alkoxide; and reacting the alkali metal dialkylaluminum alkoxide with a magnesium halide. The alkoxide derivative of the present invention can be vaporized at a low temperature, below 70.degree. C. and, therefore, effectively employed in the CVD process of a magnesium aluminate film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.