Patent · US Expired

Systems, methods and computer program products for detecting the position of a new alignment mark on a substrate based on fitting to sample alignment signals

US6064486A · kind A · utility

41Cited by
8References
48Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 21, 1998
Grant dateMay 16, 2000
Priority date
Expiry dateMay 21, 2018

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F9/7076
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Systems, methods and computer program products detect a position of a new alignment mark on a substrate by producing an alignment signal model from sample alignment signals and fitting the new alignment signal to the alignment signal model. The alignment signal model may be produced from the multiple sample alignment signals using singular value decomposition, based on subspace decomposition of the alignment signals. By producing an alignment signal model from multiple sample alignment signals, asymmetries in the sample alignment marks and/or in the coatings that are fabricated on the sample alignment marks, may be taken into account when detecting the position of a new alignment mark.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.