Xun Chen
64Patents
22h-index
123Co-inventors
91Inventor score
Filing activity: May 21, 1998 → Mar 12, 2025
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7003758B2 | System and method for lithography simulation | Physics | 203 | Expired |
| US6807503B2 | Method and apparatus for monitoring integrated circuit fabrication | Electricity | 88 | Expired |
| US6828542B2 | System and method for lithography process monitoring and control | Physics | 86 | Expired |
| US6803554B2 | System and method for lithography process monitoring and control | Physics | 73 | Expired |
| US6969837B2 | System and method for lithography process monitoring and control | Physics | 72 | Expired |
| US7053355B2 | System and method for lithography process monitoring and control | Electricity | 68 | Expired |
| US6884984B2 | System and method for lithography process monitoring and control | Physics | 67 | Expired |
| US7120895B2 | System and method for lithography simulation | Physics | 62 | Expired |
| US6806456B1 | System and method for lithography process monitoring and control | Physics | 62 | Expired |
| US6820028B2 | Method and apparatus for monitoring integrated circuit fabrication | Electricity | 60 | Expired |
| US6969864B2 | System and method for lithography process monitoring and control | Physics | 58 | Expired |
| US7114145B2 | System and method for lithography simulation | Physics | 55 | Expired |
| US7111277B2 | System and method for lithography simulation | Physics | 55 | Expired |
| US6959255B2 | Method and apparatus for monitoring integrated circuit fabrication | Electricity | 55 | Expired |
| US7117477B2 | System and method for lithography simulation | Physics | 54 | Expired |
| US7117478B2 | System and method for lithography simulation | Physics | 54 | Expired |
| US6879924B2 | Method and apparatus for monitoring integrated circuit fabrication | Electricity | 44 | Expired |
| US6892156B2 | Method and apparatus for monitoring integrated circuit fabrication | Electricity | 44 | Expired |
| US7695876B2 | Method for identifying and using process window signature patterns for lithography process control | Physics | 42 | Active |
| US6064486A | Systems, methods and computer program products for detecting the position of a new alignment mark on a substrate based on fitting to sample alignment signals | Physics | 41 | Expired |
| US9690474B2 | User interface, device and method for providing an improved text input | Physics | 29 | Active |
| US8057967B2 | Process window signature patterns for lithography process control | Physics | 27 | Active |
| US7233874B2 | Method and apparatus for monitoring integrated circuit fabrication | Electricity | 13 | Expired |
| US7873937B2 | System and method for lithography simulation | Physics | 8 | Active |
| US8318391B2 | Process window signature patterns for lithography process control | Physics | 6 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.