Photolithographic apparatus
US6067146A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 10, 1997 |
| Grant date | May 23, 2000 |
| Priority date | — |
| Expiry date | Apr 10, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70425
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photolithographic apparatus (1) including an illumination unit (3). The illumination unit (3) comprises, in this order, a radiation source unit (11), a first optical system (5) and an optical waveguide (17). The apparatus (1) further includes a second optical system (7) and a mask table (9). The apparatus (1) is adapted in such a way that both the stepper mode and the scanner mode are selectable modi, and comprises means by which the illumination unit (11), when being operative, has a slit-shaped static illumination field with a width s which is variable between s.sub.min and s.sub.max while substantially maintaining energy within the static illumination field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.