ASM Lithography B.V.
29Patents
0Active
29Granted
34Portfolio score
Filing activity: Sep 22, 1986 → Nov 5, 2001
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6208407A | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement | Physics | 546 | Expired |
| US6262796A | Positioning device having two object holders | Electricity | 378 | Expired |
| US6020964A | Interferometer system and lithograph apparatus including an interferometer system | Physics | 213 | Expired |
| US6553562B2 | Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques | Physics | 192 | Expired |
| US6297876A | Lithographic projection apparatus with an alignment system for aligning substrate on mask | Physics | 93 | Expired |
| US5144363A | Apparatus for and method of projecting a mask pattern on a substrate | Physics | 74 | Expired |
| US6160622A | Alignment device and lithographic apparatus comprising such a device | Physics | 70 | Expired |
| US6384899B1 | Lithographic projection apparatus | Physics | 61 | Expired |
| US6337484B1 | Positioning device and lithographic projection apparatus comprising such a device | Physics | 44 | Expired |
| US6122058A | Interferometer system with two wavelengths, and lithographic apparatus provided with such a system | Physics | 42 | Expired |
| US6368763B2 | Method of detecting aberrations of an optical imaging system | Emerging Cross-Sectional Technologies | 40 | Expired |
| US6466304B1 | Illumination device for projection system and method for fabricating | Physics | 37 | Expired |
| US5204712A | Support device with a tiltable object table, and optical lithographic device provided with such a support device | Electricity | 34 | Expired |
| US6563564B2 | Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby | Physics | 29 | Expired |
| US6084673A | Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders | Physics | 27 | Expired |
| US6388736B1 | Imaging method using phase boundary masking with modified illumination | Physics | 23 | Expired |
| US6054784A | Positioning device having three coil systems mutually enclosing angles of 120.degree. and lithographic device comprising such a positioning device | Emerging Cross-Sectional Technologies | 22 | Expired |
| US6028660A | Illumination unit for an optical apparatus | Physics | 20 | Expired |
| US6373552B1 | Optical correction plate, and its application in a lithographic projection apparatus | Physics | 14 | Expired |
| US6232615A | Lithographic projection apparatus with improved substrate holder | Physics | 13 | Expired |
| US5508528A | Illumination unit having a facility for preventing contamination of optical components, and photolithographic apparatus including such an illumination unit | Physics | 12 | Expired |
| US6144442A | Pneumatic support device with a controlled gas supply, and lithographic device provided with such a support device | Physics | 12 | Expired |
| US4746800A | Positioning device comprising a z-manipulator and a .theta.-manipulator | Performing Operations; Transporting | 8 | Expired |
| US6373072B1 | Lithographic projection apparatus | Physics | 8 | Expired |
| US6067146A | Photolithographic apparatus | Physics | 8 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.