Patent · US Expired

Method and lens arrangement to improve imaging performance of microlithography exposure tool

US6069739A · kind A · utility

24Cited by
16References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 30, 1998
Grant dateMay 30, 2000
Priority date
Expiry dateJun 30, 2018

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S359/90
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A technique for introducing variable phase delay across portions of a spatially coherent light beam, such as a laser, without changing the focal length of the portions of the beam. A fly's-eye lens array is utilized to distribute the light for a more uniform illumination, but different length air gaps are introduced in the lens elements to provide a variable delay of portions of the beam. In a second scheme, a set of prisms is positioned in the path of the laser beam, in which the shape of the prism introduces variable phase delay across the cross-section of the beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.