Photoresist dispense pump
US6071094A · kind A · utility
5Cited by
3References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 13, 1998 |
| Grant date | Jun 6, 2000 |
| Priority date | — |
| Expiry date | Nov 13, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A photoresist dispense pump receives photoresist from two pipelines, a first pipeline and a second pipeline, and pumps out the photoresist through a third pipeline. The photoresist dispense pump contains a first bellows and a second bellows receiving photoresist from the second pipeline, wherein the first bellows and the second bellows are separated by a partition. Photoresist is fed into the third pipeline from the second bellows. On the center region of the partition, there is a central diaphragm that allows photoresist to flow in a direction from the first bellows toward the second bellows, but not in the reverse direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.