Method for monitoring and controlling laser shock peening using temporal light spectrum analysis
US6075593A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 3, 1999 |
| Grant date | Jun 13, 2000 |
| Priority date | — |
| Expiry date | Aug 3, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/718
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for quality assurance of a laser shock peening process of workpieces includes measuring and recording or temporal light intensity data over a short period during the duration of a plasma associated with the vaporized material from laser shots fired during a production laser shock peening process. The recorded temporal data is then analyzed to obtain an instantaneous optical spectrum of the plasma and then used to provide statistical control of the production laser shock peening process. One correlation function of the present invention is based on a time integrated spectral peak intensity wavelength curve for each of the laser firings and for which a peak intensity wavelength is determined for a plurality of times during each plasma of a plurality or all of the firings. Production results from the analysis of the instantaneous optical spectrum is used to determine whether the production laser shock peening process is acceptable. One embodiment of the method compares the production results from the analysis of the instantaneous optical spectrum to a correlation of test results from the analysis of instantaneous optical spectrum and high cycle fatigue failure based on high c…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.