Process for preventing gas leaks in an atmospheric thermal processing chamber
US6075922A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 7, 1997 |
| Grant date | Jun 13, 2000 |
| Priority date | — |
| Expiry date | Aug 7, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process and system for preventing gases from either leaking into or out of a thermal processing chamber that is designed to operate at or near atmospheric pressure is disclosed. For instance, in one embodiment, gases are prevented from leaking into a thermal processing chamber by maintaining the pressure within the chamber at levels that are slightly greater than atmospheric pressure. In an alternative embodiment, in order to prevent gases from leaking out of the chamber, the pressure within the chamber is maintained at levels slightly less than atmospheric pressure. During operation of the thermal processing chamber, a gas is continuously circulated through the chamber. In order to carry out the process of the present invention, a pressure control device can be placed upon the gas outlet for maintaining the pressure within the chamber within a desired range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.