Wet/dry substrate processing apparatus
US6077321A · kind A · utility
52Cited by
2References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 7, 1997 |
| Grant date | Jun 20, 2000 |
| Priority date | — |
| Expiry date | Nov 7, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67778
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A buffer chamber is provided between a transfer chamber and a cleaning/drying chamber, and completely-closable shutters are provided between the transfer chamber and the buffer chamber as well as between the buffer chamber and the cleaning/drying chamber. The cleaning/drying chamber serving as a composite processing part including a processing in the wet atmosphere is connected with the remaining chambers of dry atmospheres.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.