Patent · US Expired

Method for manufacturing vertical bipolar transistor having a field shield between an interconnecting layer and the field oxide

US6077753A · kind A · utility

1Cited by
10References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 2, 1998
Grant dateJun 20, 2000
Priority date
Expiry dateJul 2, 2018

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002

Abstract

The present invention relates to a vertical bipolar power transistor primarily intended for radio frequency applications and to a method for manufacturing the bipolar power transistor. The power transistor comprises a substrate (13), a collector layer (15) of a first conductivity type on the substrate, a base (19) of a second conductivity type electrically connected to the collector layer, an emitter (21) of the first conductivity type electrically connected to the base, the base and the emitter each being electrically connected to a metallic interconnecting layer (31,33), the interconnecting layers (31,33) being at least in parts separated from the collector layer (15) by an insulation oxide (17). According to the invention the power transistor substantially comprises a field shield (25) electrically connected to the emitter, and located between the metallic interconnecting layer of the base and the insulation oxide.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.