Inspection system simultaneously utilizing monochromatic darkfield and broadband brightfield illumination sources
US6078386A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 13, 1998 |
| Grant date | Jun 20, 2000 |
| Priority date | — |
| Expiry date | Jul 13, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8825
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.