Optimized phase shift design migration
US6083275A · kind A · utility
95Cited by
8References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 9, 1998 |
| Grant date | Jul 4, 2000 |
| Priority date | — |
| Expiry date | Jan 9, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/26
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for converting an integrated circuit design to a phase-shift complaint mask design. The method comprises the steps of locating features of the integrated circuit that violate predetermined design criteria converting error flags to physical marker shapes, modifying the located features using layout modification system technology based on a predetermined cost constraint, determining if all violations are corrected, and either changing the cost constraint to a higher cost constraint if violations still exist and repeating the process or terminating the conversion if all violations are corrected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.