Ion implanter
US6084240A · kind A · utility
7Cited by
4References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 19, 1998 |
| Grant date | Jul 4, 2000 |
| Priority date | — |
| Expiry date | Aug 19, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2001
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A temperature monitor is included inside an ion implanting chamber to constantly monitor the wafer temperature during ion implantation. The measured temperature signal is sent to a central control system through an interface circuit. When an abnormal temperature is detected, the central control system automatically ceases the ion implantation operation and triggers an alarm for operators.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.