Method of growing films on substrates at room temperatures using catalyzed binary reaction sequence chemistry

US6090442A · kind A · utility

Assignee

• The Regents of the University of Technology Office of Technology Transfer · US

Inventors

• Jason W. Klaus · Portland, US
• Ofer Sneh · Boulder, US
• Steven M. George · Boulder, US

Key dates

• Filing date: Oct 2, 1997
• Grant date: Jul 18, 2000
• Expiry date: Oct 2, 2017

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/44
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The present invention provides a method for growing atomic layer thin films on functionalized substrates at room temperature using catalyzed binary reaction sequence chemistry. Specifically, the atomic layer films are grown using two half-reactions. Catalysts are used to activate surface species in both half-reactions thereby enabling both half-reactions to be carried out at room temperature.