Semiconductor device of SiC having an insulated gate and buried grid region for high breakdown voltage
US6091108A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 17, 1997 |
| Grant date | Jul 18, 2000 |
| Priority date | — |
| Expiry date | Nov 17, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/8325
Abstract
A semiconductor device of SiC is adapted to hold high voltages in the blocking state thereof. The device comprises two parts (1, 2) each comprising one or more semiconductor layers of SiC and connected in series between two opposite terminals of the device, namely a sub-semiconductor device (1) able to withstand only low voltages in the blocking state thereof and a voltage-limiting part (2) able to withstand high voltages in the blocking state of the device and adapted to protect said sub-semiconductor device by taking a major part of the voltage over the device in the blocking state thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.