Patent · US Expired

Semiconductor device of SiC having an insulated gate and buried grid region for high breakdown voltage

US6091108A · kind A · utility

57Cited by
17References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 17, 1997
Grant dateJul 18, 2000
Priority date
Expiry dateNov 17, 2017

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D62/8325

Abstract

A semiconductor device of SiC is adapted to hold high voltages in the blocking state thereof. The device comprises two parts (1, 2) each comprising one or more semiconductor layers of SiC and connected in series between two opposite terminals of the device, namely a sub-semiconductor device (1) able to withstand only low voltages in the blocking state thereof and a voltage-limiting part (2) able to withstand high voltages in the blocking state of the device and adapted to protect said sub-semiconductor device by taking a major part of the voltage over the device in the blocking state thereof.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.