Method of making a Schottky diode with sub-minimum guard ring
US6096618A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 20, 1998 |
| Grant date | Aug 1, 2000 |
| Priority date | — |
| Expiry date | Jan 20, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/942
Abstract
The invention is a method of fabricating a self-aligned, sub-minimum guard ring for a Schottky diode device wherein the sub-minimum guard ring is positioned at the inside edges of adjacent isolation structures and is self-aligned to the intrinsic base implanted regions. In this particular invention, illustrating the guard ring fabrication technique, an improved Schottky diode is fabricated at minimum groundrules which utilizes a frequency-doubling resist and an appropriate mask to provide the implant mask for a p- or n-type guard ring. This shallow implant near the surface prepares a guard ring that minimizes the electric field at the interface where the deposited metal or silicide joins the STI structure. Additional ion implants with energies greater than and less than the guard ring implantation energy may be deposited to tailor the substrate surface and reduce the parasitic capacitance of the diode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.