Process for annealing a moving metal substrate
US6099667A · kind A · utility
6Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 10, 1998 |
| Grant date | Aug 8, 2000 |
| Priority date | — |
| Expiry date | Feb 10, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC21D1/773
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for annealing a moving metal substrate, especially a steel sheet. The process includes providing a gas under reduced pressure facing a first side of the substrate, creating a cold plasma in the gas by means of plasma discharges between the substrate and a counter electrode, the plasma being uniformly divided over the width of the substrate, and dissipating electrical power from the plasma discharges into the substrate, resulting in a uniform distribution of the density of power over the width of the substrate and a quick and uniform heating thereof
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.