Alain Weymeersch
14Patents
6h-index
9Co-inventors
55Inventor score
Filing activity: Nov 9, 1984 → Nov 15, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6612816B1 | Molecular pump | Mechanical Engineering; Lighting; Heating | 61 | Expired |
| US6933460B2 | Method and device for plasma treatment of moving metal substrates | Electricity | 38 | Expired |
| US6171659A | Process for the formation of a coating on a substrate and device for the use this process | Chemistry; Metallurgy | 23 | Expired |
| US7156960B2 | Method and device for continuous cold plasma deposition of metal coatings | Electricity | 7 | Expired |
| US6638032B1 | Acoustic vacuum pump | Mechanical Engineering; Lighting; Heating | 7 | Expired |
| US6099667A | Process for annealing a moving metal substrate | Chemistry; Metallurgy | 6 | Expired |
| US4559123A | Device for electrolytically depositing a lining metal layer over a metal strip | Chemistry; Metallurgy | 5 | Expired |
| US6432281B1 | Process for formation of a coating on a substrate | Chemistry; Metallurgy | 4 | Expired |
| US6231727A | Process for stripping the surface of a substrate and apparatus for implementing this process | Electricity | 4 | Expired |
| US6334751B1 | Air lock | Mechanical Engineering; Lighting; Heating | 3 | Expired |
| US6361628B1 | Method for making a composite metal product | Chemistry; Metallurgy | 2 | Expired |
| US6083359A | Process and device for forming a coating on a substrate by cathode sputtering | Electricity | 1 | Expired |
| US6337005B2 | Depositing device employing a depositing zone and reaction zone | Chemistry; Metallurgy | 1 | Expired |
| US6485615B1 | Process of depositing a coating onto a substrate by reactive sputtering | Chemistry; Metallurgy | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.