Photoresist composition containing a novel polymer
US6103443A · kind A · utility
5Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1997 |
| Grant date | Aug 15, 2000 |
| Priority date | — |
| Expiry date | Nov 21, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition comprising a film forming resin obtained by condensing a phenol derivative and a substituted diphenyl ether, a photoactive compound, and a solvent. The photoresist composition may also contain an alkali-soluble, film-forming resin, such as a novolak resin. The photoresist of the instant invention improves the photospeed, resolution and thermal stability of the photoresist images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.