Fluid nozzle system and method in an emitted energy system for photolithography
US6105885A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 1998 |
| Grant date | Aug 22, 2000 |
| Priority date | — |
| Expiry date | Apr 3, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70858
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle passage (118) may be defined within the nozzle cavity (110) and extend a longitudinal length (120) from the down-stream end (104) of the nozzle body (100) into the nozzle cavity (110). A discharge orifice (124) may also be defined at the down-stream end (104) of the nozzle cavity (110) and have an associated width (126). The width (126) of the discharge orifice (124) may be substantially less than the longitudinal length (120) of the nozzle passage (118).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.