Electron beam exposure apparatus and its control method
US6107636A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 21, 1998 |
| Grant date | Aug 22, 2000 |
| Priority date | — |
| Expiry date | May 21, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31764
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam exposure apparatus for drawing a pattern on an object to be exposed using a plurality of electron beams includes an electron source for emitting electrons, a plurality of elementary electron optical systems for respectively forming intermediate images of the electron source, a projection electron optical system for projecting the plurality of intermediate images onto the object, a scanning unit for scanning the plurality of intermediate images to be projected onto the object within a plurality of elementary exposure fields in accordance with a common scanning width so as to expose a unit exposure field made up of the plurality of elementary exposure fields, and an adjustment unit for dynamically adjusting a minimum scanning width of the common scanning width in correspondence with a feature of a pattern to be drawn by exposure in the corresponding unit exposure field of the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.