Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
US6107637A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 1998 |
| Grant date | Aug 22, 2000 |
| Priority date | — |
| Expiry date | Aug 11, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3175
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electronic beam type exposure or inspection or measurement apparatus and method including an electron optical system, an electron beam image detection optical system for detecting a secondary electron beam image generated from an inspected object by electron beams irradiated from the electron optical system, and an optical height detection apparatus for optically detecting a height of a surface in an area on the inspected object. A focus controller is provided for calculating a focus control current or a focus control voltage based on a correction parameter between a height of a surface on the inspected object and a focus control current or a focus control voltage and supplying the same to an objective lens of the electron optical system in such a manner that an electron beam is focused on the inspected object in a properly- focused state. A deflection controller is provided for correcting an image distortion containing a magnification error of an electron beam image caused on the basis of the focus control, and an image processor is provided for inspecting or measuring a pattern formed on the inspected object based on a secondary electron beam image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.