System for selective electron beam irradiation
US6110318A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 26, 1997 |
| Grant date | Aug 29, 2000 |
| Priority date | — |
| Expiry date | Nov 26, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Provided is the ability to selectively irradiate a designated irradiation target portion of a target material with a beam of electrons. Target material is moved at a substantially constant velocity in one direction along a path that is intersected by an electron beam. The electron beam is translated in a direction transverse to the direction of the target material movement to intersect the designated portion of the target. This enables the designated target portion, e.g., a target irradiation path, to be followed by the electron beam as the target material moves past the beam. Also provided is control of electron beam dose delivered to the designated irradiation target portion. Here, as a target material is moved along the path, the electron beam is also scanned in a direction parallel with the direction of target material movement to control the electron beam dwell time at points along the designated irradiation target portion, to deliver a specified electron beam dose to points along the designated portion of the target material. This scanning can control the electron beam dwell time to deliver a substantially uniform electron beam dose or to deliver an electron beam dose that fa…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.