Surface coating method to highlight transparent mask defects
US6110623A · kind A · utility
3Cited by
4References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 4, 1999 |
| Grant date | Aug 29, 2000 |
| Priority date | — |
| Expiry date | Jan 4, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for detection of a photomask defect. The method comprises the steps of applying a contrast-enhancing coating on the photomask and optically inspecting the photomask for defects. The contrast-enhancing coating may be copper, aluminum, molybdenum silicide, or any material capable of altering the reflectivity or transmissivity of defects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.