Electroplating fixture for high density substrates
US6110815A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 23, 1998 |
| Grant date | Aug 29, 2000 |
| Priority date | — |
| Expiry date | Jun 23, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/241
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of electroplating a high density integrated circuit (IC) substrate using a conductive elastomer including the steps of providing an IC substrate made of nonconductive material having a plurality of conductive traces with conductive trace lands formed on its surface. Covering only the traces (not the trace lands) with a plating resist and exposing portions of the conductive traces. Inserting the IC substrate into a electroplating fixture. Engaging a conductive elastomer to the IC substrate, covering the plurality of conductive traces and electrically connecting all of the traces together. Electroplating the trace lands on the IC substrate with conductive material (such as gold or nickel) by using the conductive elastomer as the electrical connection to the trace lands (via the exposed metal traces). Disengaging the conductive elastomer after electroplating is finished and removing the IC substrate from the electroplating fixture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.