Apparatus for carrying substrates processed in an etching process and protecting thereof from being dampened by droplets
US6117268A · kind A · utility
2Cited by
3References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 1999 |
| Grant date | Sep 12, 2000 |
| Priority date | — |
| Expiry date | Jul 29, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/135
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The apparatus of the present invention is used to carry substrates processed in an etching process and provides a guiding member to shelter and protect substrates from being dampened by droplets. The apparatus comprises spaced chucks connected to a substrate holder with two arms, respectively. The guiding member is a roof plate disposed under the chucks and abutted against the arms, so that the guiding member can induce the droplets falling from the chucks to flow to the arms. The substrates can be effectively kept dry and clean.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.