Compositions and method for forming doped A-site deficient thin-film manganate layers on a substrate
US6117571A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 28, 1997 |
| Grant date | Sep 12, 2000 |
| Priority date | — |
| Expiry date | Mar 28, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/1107
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming an A site deficient thin film manganate material on a substrate from corresponding precursor(s), comprising liquid delivery and flash vaporization thereof to yield a precursor vapor, and transporting the precursor vapor to a chemical vapor deposition reactor for formation of an A site deficient manganate thin film on a substrate. The invention also contemplates a device comprising an A site deficient manganate thin film, wherein the manganate layer is formed on the substrate by such a process and is of the formula La.sub.x M.sub.y MnO.sub.3, where M=Mg, Ca, Sr, or Ba, and (x+y)<1.0, and preferably from about 0.5 to about 0.99.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.