Polyphenol compound, quinonediazide ester and positive photoresist composition
US6120969A · kind A · utility
13Cited by
7References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 2, 1999 |
| Grant date | Sep 19, 2000 |
| Priority date | — |
| Expiry date | Apr 2, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is, for example, bis(2,5-dimethyl-3-(2-hydroxy-5-ethylbenzyl)-4-hydroxyphenyl)methane and quinonediazide ester thereof. These are used for positive photoresist compositions. According to the invention, positive photoresist compositions having a high definition, a high sensitivity and a large exposure margin can be provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.