Projection exposure apparatus and method
US6122036A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 7, 1998 |
| Grant date | Sep 19, 2000 |
| Priority date | — |
| Expiry date | Dec 7, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7034
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a projection exposure apparatus and method in which a substrate is exposed with a projected image of a mask through a projection optical system, a table which is movable in a direction of an optical axis of the projection optical system in arranged at an image side of the projection optical system to hold the substrate. A tilt amount of the table is monitored, and position information of a mark on the table is detected, which changes in accordance with the tilt of the table. Information on the relationship between a displacement amount of the substrate and a plane perpendicular to the optical axis and the tilt angle of the substrate is obtained, based on the monitored tilt amount and the position information of the mark.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.