Polymers for photoresist compositions

US6124405A · kind A · utility

Assignee

• Arch Specialty Chemicals, Inc. · US

Inventors

• Carl-Lorenz Mertesdorf · Wetzikon, CH
• Hans-Thomas Schacht · Rheinfelden (Baden), DE
• Norbert Muenzel · Heitersheim, DE
• Pasquale Alfred Falcigno · Yonkers, US

Key dates

• Filing date: May 19, 1999
• Grant date: Sep 26, 2000
• Expiry date: May 19, 2019

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/106
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Polymers having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: ##STR1## in which R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 and w, x, y, and z are defined herein, are suitable as binders for DUV photoresists of high processing stability and flow resistance.