X-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, manufacturing method thereof and method of polishing silicon carbide film
US6127068A · kind A · utility
9Cited by
4References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 31, 1998 |
| Grant date | Oct 3, 2000 |
| Priority date | — |
| Expiry date | Mar 31, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/10
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A surface of a silicon carbide film which is an x-ray membrane 12 is made so that the surface roughness thereof may be 1.0 nm or less in terms of Ra (center-line average roughness) and the surface may have no scratch of 0.25 .mu.m or more in width. The surface of the silicon carbide film, which is the x-ray membrane 12 is polished a diamond particle, of a predetermined particle diameter, and colloidal silica dispersed in a solution containing hydrogen peroxide as an abrasive material, so that the surface is highly precise.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.