Method of making resist patterns
US6127098A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 1997 |
| Grant date | Oct 3, 2000 |
| Priority date | — |
| Expiry date | Oct 21, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of forming a resist pattern including the steps of: forming a resist film by coating resist on the surface of a member to be processed, the resist containing a composition A capable of increasing the volume by chemical reaction; exposing and developing the coated resist film to form a pattern having an opening; and chemically reacting fluid containing a composition B with the composition A by contacting the fluid with the composition A to change the size of the opening of the resist film, the composition B being capable of increasing the volume of the composition A by chemical reaction with the composition A. It is possible to form a fine resist pattern by a simple method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.