X-ray mask blank, x-ray mask, and pattern transfer method
US6128363A · kind A · utility
11Cited by
1References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 26, 1997 |
| Grant date | Oct 3, 2000 |
| Priority date | — |
| Expiry date | Nov 26, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/10
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
An X-ray mask blank makes it possible to manufacture an X-ray mask which has an extremely low stress, thus providing an extremely high positional accuracy. In the X-ray mask blank, an X-ray transparent film is formed on a substrate, and an X-ray absorber film is formed on the X-ray transparent film. The top and/or the bottom of the X-ray absorber film is provided with a film in which the product of the film stress and the film thickness thereof lies in the range of 0 to .+-.1.times.10.sup.4 dyn/cm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.