Slurry providing system
US6132078A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 28, 1998 |
| Grant date | Oct 17, 2000 |
| Priority date | — |
| Expiry date | Aug 28, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B57/02
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A slurry providing system, located between a main slurry providing system and a CMP machine, includes a providing barrel, which can either be used as a buffer tank to provide slurry to the CMP machine with interruption, or as an independent backup tank for store slurry. The providing barrel also includes an impeller to stir slurry to prevent slurry deposition, and a liquid level sensor to monitor slurry level. The slurry providing system further includes a pump to continuously provide slurry from the providing barrel when the main slurry providing system is down. There is a pressure-regulating valve between the slurry providing system and the CMP machine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.